Optical mask and MOPA laser apparatus including the same

Optical: systems and elements – Light control by opaque element or medium movable in or...

Reexamination Certificate

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C359S563000, C359S569000, C359S571000, C372S103000

Reexamination Certificate

active

07599106

ABSTRACT:
The present invention relates to an optical mask at low cost and so on having a structure capable of reducing further a peak of beam intensity caused by diffraction. The optical mask is constructed by overlapping a first mask and a second mask. The first mask and second mask each are a serrated aperture mask. The schematic shapes of the respective apertures of the first mask and second mask are almost rectangular and identical to each other. The fringe defining the aperture of the first mask is machined in a serrated shape, and the fringe defining the aperture of the second mask also is machined in a serrated shape. In the optical mask, the first mask and second mask are overlapped so that the serrations of the fringes defining the respective apertures of the first mask and second mask are located alternately.

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patent: 5999319 (1999-12-01), Castracane
patent: 2001/0021546 (2001-09-01), Suwa
Bontoux et al. “Study of Serrated Aperture for a Cassegrain Booster Amplifier”, Optical Review vol. 5, No. 4 (1998), pp. 234-241.
Annual Progress Report 2002 Institute of Laser Engineering Osaka University.
Serrated-aperture apodizers for high-energy laser systems Jerome M. Auerbach, Victor P. Karpenko: Applied Optics, vol. 33 Issue 15 p. 3179 (May 1994).
Beamlet Pulse-Generation and Wavefront-Control System B.M. Van Wonterghem, J.T. Salmon, R.W. Wilcox: UCRL-LR-105821-95-1, Lawrence Livermore National Laboratory, Livermore, CA, (1995).

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