Optical mask and method of correcting the same

Details Optical mask and method of correcting the same Optical mask and method of correcting the same

1993-02-26

1995-08-08

Chapman, Mark A.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

2504922, G03F 900

Patent

active

054397634

ABSTRACT:
An optical mask for a projection optical system and a method of correcting the mask wherein the mask includes a light intercepting pattern formed on a transparent substrate and a phase shifter for changing the phase of an exposure light provided at predetermined openings of the light intercepting pattern. An etching stopper film which transmits the exposure light is provided between said phase shifter and said light intercepting pattern and for correction of the mask a focused ion beam is utilized for removal of defects by the phase shifter.

REFERENCES:
patent: 4367119 (1983-01-01), Logan et al.
patent: 4503329 (1985-05-01), Yamaguchi et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5358806 (1994-10-01), Haraichi et al.
Journal of the Institute of Applied Physics, vol. 60, No. 11, (1991), pp. 1076-1086, "High Resolution Light Lithography Technology Using Phase Shift Method".

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