Optical mask and exposure method using the optical mask

Details Optical mask and exposure method using the optical mask Optical mask and exposure method using the optical mask

1993-09-09

1995-06-27

Sugarman, Scott J.

Optical: systems and elements

Diffraction

From zone plate

359566, 359742, G02B 2744

Patent

active

054284783

ABSTRACT:
An optical mask including a 2.pi.n phase shifter pattern, a .pi.(2n+1) phase shifter pattern, an intermediate phase shifter pattern which shifts the phase of an incident light by an angle between 2.pi.n and .pi.(2n+1), and a reversed intermediate phase shifter pattern which shifts the phase of an incident light by an angle being reversed by .pi. for the phase shift angle of the intermediate phase shifter pattern. The intermediate phase shifter patterns are formed in the vicinity of the reversed intermediate phase shifter patterns having light shielding films in between.

REFERENCES:
patent: 5073007 (1991-12-01), Kedmi et al.
patent: 5218471 (1993-06-01), Swanson et al.
Watanabe et al., "Transparent phase shifting mask with multi-stage phase shifter and comb-shaped shifter", SPIE, vol. 1463, pp. 101-110, 1991, Japan.
Miyazaki et al., "A new phase shifting Mask Structure for Positive Resist Process", SPIE, vol. 1464, pp. 327-335, 1991, Japan.
Terasawa et al., "Variable Phase-Shift Mask for deep sub-micron optical lithography", SPIE, vol. 1463, pp. 197-206, 1991, Japan.

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