Optical lithography fluoride crystal annealing furnace

Details Optical lithography fluoride crystal annealing furnace Optical lithography fluoride crystal annealing furnace

2006-02-14

2006-02-14

Hiteshew, Felisa (Department: 1722)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Processes of growth from liquid or supercritical state

Havin growth from molten state

C117S082000, C117S083000

Reexamination Certificate

active

06997987

ABSTRACT:
A method of making below 250-nm UV light transmitting optical fluoride lithography crystals includes applying heat along a shortest path of conduction of a selected optical fluoride crystal, heating the optical fluoride crystal to an annealing temperature, holding the temperature of the optical fluoride crystal at the annealing temperature, and gradually cooling the optical fluoride crystal to provide a low-birefringence optical fluoride crystal for transmitting below 250-nm UV light.

REFERENCES:
patent: 6309461 (2001-10-01), Gianoulakis et al.
patent: 6802901 (2004-10-01), Kerdoncuff et al.

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