Optical lithographical imaging system including optical transmis

Details Optical lithographical imaging system including optical transmis Optical lithographical imaging system including optical transmis

1996-05-16

1998-03-24

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

430 5, G03F 900

Patent

active

RE0357537

ABSTRACT:
In an optical lithographical system (e.g., 100) for printing features of a patterned mask (e.g., 103) into a workpiece (e.g., 120), such as in a semiconductor device, a one- or two-dimensional (depending on the features of the mask) optical transmission phase-shift diffracting device (e.g., 107) is inserted between an optical condensor (e.g., 105) and the patterned mask whose features are to be printed into the workpiece. The diffracting device is designed so as to enable an imaging lens system (e.g., 102) to collect more than merely a single order of the resulting diffraction patterns of the features of the mask and, by varying the spatial periodicity of the diffracting device, to tailor the illumination incident on the mask in accordance with the features (e.g., 114, 115) of the mask.

REFERENCES:
patent: 4738910 (1988-04-01), Ito et al.
patent: 5418092 (1995-05-01), Okamoto
Soc. of Photooptical Instrumentation Engineers (SPIE), R. Pforr et al., "A New Resolution Enhancement Mask for Projection Lithographic Based on In-Situ Angular Illumination", Aug. 24, 1992.
Soc. of Photooptical Instrumentation Engineers (SPIE), H. Kang et al., "A New Method of Tilted Illumination Using Grating Mask", Aug. 24, 1992.
"193-nm Step-and-Scan Illuminator" Excimer Direct Processing Program; The Meeting of the Advisory Panel, Lincoln Laboratory, Massachusetts Institute of Technology, Dec. 14, 1992.
Soc. of Photooptical Instrumentation Engineers (SPIE), Y. Oh et al., "A New Mask Technique for Optical Lithography", Aug. 24, 1992.

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