Optical lithographic system

Details Optical lithographic system Optical lithographic system

1982-09-22

1984-05-22

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

219121LA, H01L 2176, B23K 900

Patent

active

044503580

ABSTRACT:
A high resolution optical lithographic system for exposing 0.25 microns to 0.5 microns linewidths on integrated circuit substrates. The system comprises a deep ultra-violet (UV) source of illumination in conjunction with an optical condenser system and high reduction ratio optical projection system and a deep UV sensitive photoresist. A three-slit interferometric sensor may be used to provide the resolution required to automatically focus the system.

REFERENCES:
patent: 3154371 (1964-10-01), Johnson
patent: 3770340 (1973-11-01), Cromin et al.
patent: 3947093 (1976-03-01), Goshima
patent: 4128752 (1978-12-01), Gravel
patent: 4151008 (1979-04-01), Kirkpatrick
patent: 4315130 (1982-02-01), Inagaki et al.

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