Optical line width measuring apparatus and method

Details Optical line width measuring apparatus and method Optical line width measuring apparatus and method

1980-02-14

1982-05-18

Punter, William H.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

74104, 356384, G01B 902, G01B 1102

Patent

active

043302130

ABSTRACT:
Optical monitoring of the lateral dimensions of a pattern disposed on a substrate in the form of a wafer or mask is accomplished by testing for the lateral dimensions of a diffraction grating test pattern disposed adjacent the pattern. A beam of monochromatic light such as from a laser is diffracted by the test pattern and detectors determine the intensity of the diffracted beams. The detectors are disposed in a plane orthogonal to the plane of the test pattern and to the direction of the grating lines. The detectors are selectively spaced from each other according to the periodicity d of the grating and the width of the grating lines a is determined from a relationship of the detected intensities of the beams.

REFERENCES:
patent: 3312824 (1967-04-01), Cook
patent: 4200396 (1980-04-01), Kleinknecht et al.
patent: 4236823 (1980-12-01), Roach et al.
Steele, Jr. et al., "Parallel Incidence for Diffraction Grating Strain Gages", Instruments & Control Systems, 12-1971, pp. 64-66.
Kasdan et al., "Linewidth Measurements by Diffraction Pattern Analysis", SPIE vol. 80, Developments in Semiconductor Microlithography, 1976, pp. 54-63.
Rottmann, H. R., "Radiation Filter", IBM Tech. Disc. Bull., vol. 13, 8-1970, p. 755.

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