Optical: systems and elements – Having significant infrared or ultraviolet property – Fluid filter or fluid mirror
Reexamination Certificate
2006-10-10
2006-10-10
Dang, Hung X (Department: 2873)
Optical: systems and elements
Having significant infrared or ultraviolet property
Fluid filter or fluid mirror
C359S667000, C359S513000, C355S030000
Reexamination Certificate
active
07119952
ABSTRACT:
An exposure apparatus for exposing a substrate to ultraviolet light via a pattern of a reticle. The apparatus includes an optical element disposed on a path of the ultraviolet light extending from a light source to the substrate, a holder configured to hold the optical element, and a container configured to accommodate the optical element therein. The container has a partition wall with an opening through which the holder extends. The partition wall and the holder have a gap therebetween inside the opening. The holder is configured to move in a range of the opening so as to adjust a position of the optical element. The partition wall and the holder is configured so that a portion of the gap can be filled with a detachable filling cover. The apparatus further includes an outer cover detachably mounted on the container to cover the partition wall gas-tightly, and a supplier configured to supply inert gas into the container.
REFERENCES:
patent: 2004/0156049 (2004-08-01), Breninger et al.
Okabe, Hideo. “Photochemistry of Small Molecules,” A Wiley-Interscience Publication, 1978, pp. 178-179.
Dang Hung X
Martinez Joseph
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