Optical waveguides – Integrated optical circuit
Reexamination Certificate
1999-09-23
2001-11-27
Dang, Hung Xuan (Department: 2873)
Optical waveguides
Integrated optical circuit
C385S002000, C385S008000
Reexamination Certificate
active
06324314
ABSTRACT:
BACKGROUND OF THE INVENTION
The present invention relates to an optical hybrid integrated device having such semiconductor optical elements as a laser diode and a photodiode and an optical waveguide mounted on its substrate and a method of making such an optical waveguide device.
The optical hybrid integrated device is a device of the type in which there are mounted on the same substrate desired elements such as a light emitting element, a photodetector, an optical modulator, an optical filter, a wavelength shifter, an optical waveguide and an optical coupler. Furthermore, one end portion of an optical fiber, for instance, is positioned in and fixed to a V-groove cut in a silicon substrate with the end face of the optical fiber facing toward one end face of the optical waveguide for connection with another optical device. For example, the active layer (a light emitting region) of the laser diode is several micrometers above its electrode; this vertical position is appreciably lower than that of a core of the optical waveguide to which the laser diode is to be optically connected. The core is usually about 10 &mgr;m thick and buried in an about 40-&mgr;m thick clad layer of the optical waveguide substantially centrally thereof. Accordingly, in the case where the clad layer with the core buried therein is formed on the silicon substrate and the laser diode with its active layer underside is disposed on the same substrate surface in opposing relation to the end face of the core, the vertical positions of the optical waveguide (core) and the active layer of the laser diode are greatly displaced from each other. An optical hybrid integrated device manufacturing method which solves this problem is described, for example, in Horiguchi, “Hybrid Optical Integration Techniques,” Denshi Zairyou, pp.97-102, June, 1995.
With reference to
FIGS. 1A through 1D
, the proposed manufacturing process will be described below in brief. To begin with, a terrace
10
A is formed by etching in the surface of a silicon substrate
10
and then an under-clad glass layer
2
A of a quartz optical waveguide is formed over the entire area of the substrate surface as depicted in FIG.
1
A. Then, the under-clad layer
2
A is ground until the top of the terrace
10
A is exposed, that is, the terrace
10
A is surrounded by the under-clad layer
2
A, after which a height adjustment layer
2
B of the same material as that for the clad layer is formed all over the under-clad layer
2
A including the terrace
10
A as depicted in FIG.
1
B. Then, a core
2
C which serves as an optical waveguide is formed by patterning, and an over-clad layer is formed all over the substrate surface as shown in FIG.
1
C. After this, the over-clad layer is selectively etched away to exposed the top surface of the terrace
10
A as depicted in
FIG. 1D. A
semiconductor optical element
3
, such as a laser diode or photodiode, is mounted on the terrace.
The thickness of the height adjustment layer
2
B is predetermined so that the core
2
C lies at the same vertical position as that of an active layer
3
A of the optical element
3
. According to this method, the vertical positioning of the active layer
3
A of the semiconductor optical element
3
with respect to the optical waveguide (core)
2
C need not be performed at the time of mounting the semiconductor optical element. Since an optical waveguide, an optical element, an optical fiber, and so forth are usually mounted on a single substrate, the fabrication procedure is complex and it is difficult to increase the packaging density.
A method which facilitates the manufacture of the optical hybrid integrated device and provides increased packaging density is proposed, for example, in Japanese Patent Application Laid-Open Gazette No. 10-133069, according to which a second substrate with an optical waveguide formed thereon is loaded on a first substrate with a semiconductor optical element mounted thereon, by positioning them using alignment marks formed thereon at corresponding positions. With this method, the depth of a V-groove for fixing therein an optical fiber can be predetermined so that the core of the optical fiber and the optical waveguide are at the same vertical position.
According to this method, for example, as depicted in
FIG. 2A
, there are formed alignment marks
18
and solder-coated electrodes
15
A and
16
A in the surface of arectangular silicon substrate
10
which has V-grooves
11
A and
11
B cut therein. Further, as shown in
FIGS. 2B and 2C
, there are provided on the surface of a second substrate
20
a clad layer
21
and a core
22
buried therein and forming optical waveguides
22
a
and
22
b.
On the surface of the second substrate
20
there are formed marks
24
corresponding to the alignment marks
18
on the first substrate
10
. By accurately maintaining the positional relationships of the alignment marks
18
to the V-grooves
11
A,
11
B and the solder-coated electrodes
15
A and
16
A, the second substrate
20
is mounted on and soldered to the first substrate
10
with the clad layer
21
on the underside with the alignment marks held in position.
In this optical hybrid integrated device, the depths of the V-grooves
11
A and
11
B are predetermined taking account the thickness of a solder layer and the height from the clad surface of the optical waveguide to the core so that the vertical position of the core of the optical fiber is the same as that of the optical waveguide (core) relative to the top surface of the substrate
10
. As regards the heights of the active layers of a light receiving element and a light emitting element which are fixed on the solder-coated electrodes
15
A and
16
A on the substrate
10
, the thickness of an metal electrode on which a solder layer is formed is predetermined so that the vertical positions of the light receiving face and the light emitting face of the optical elements are the same as the vertical position of the optical waveguide (core). However, it is difficult that the solder-coated metal electrodes having thicknesses of several to tens of micrometers are formed with tolerances of 1 &mgr;m or better. This problem could be solved by a method in which four or two pedestals are formed to desired thicknesses on a substrate with tolerances of 1 &mgr;m or better in correspondence to four corners or both sides of the bottom the light receiving element or light emitting element except its central area, the light receiving element or light emitting element is mounted on the pedestals and an electrode on the substrate and the light receiving element or light emitting element is connected by a solder bumps midway between the four or two pedestals. However, this method has the defect of increasing manufacturing steps for forming the pedestals.
SUMMARY OF THE INVENTION
It is therefore an object of the present invention to provide an optical hybrid integrated device which is simple-structured and high in packaging density and a method of making such a device.
The optical hybrid integrated device according to the present invention has a first substrate with a semiconductor optical element mounted thereon and a second substrate with an optical waveguide formed thereon, and an under-clad layer and a core both forming the optical waveguide and a height adjustment layer covering the core are formed of the same material as that for the clad layer, and an overclad layer is formed over the height adjustment layer except its both marginal portions. By this, terraces are formed on both marginal portions of the second substrate. On the other hand, a concavity is formed in the surface of the first substrate except both marginal portions of the center region on which the second substrate is mounted, by which banks are formed on both marginal portions of the center region of the first substrate. The first substrate and the second substrate are joined together with the terraces of the latter resting on the banks of the former.
REFERENCES:
patent: 6134368 (2000-10-01), Sakata
Miyashita Takuya
Ukechi Mitsuo
Connolly Bove Lodge & Hutz
Dang Hung Xuan
Japan Aviation Electronics Industry Limited
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