Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2006-10-20
2009-11-03
Lauchman, L. G (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C356S618000
Reexamination Certificate
active
07612882
ABSTRACT:
Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.
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Gao Jun
Robinett Warren
Wang Shih-Yuan
Wu Wei
Yu Zhaoning
Hewlett--Packard Development Company, L.P.
Lauchman L. G
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