Optical film thickness measuring device for measuring two-layer

Details Optical film thickness measuring device for measuring two-layer Optical film thickness measuring device for measuring two-layer

1989-12-29

1991-03-12

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356382, G01N 2186

Patent

active

049995081

ABSTRACT:
The optical film thickness measuring device comprises a spectral reflectance measuring device for measuring spectral reflectance of two layers of a two-layer optical film, a memory device for storing, as reflectance data theoretical values of optical thickness and refractive index of each layer of the two-layer optical film as well as those of reflectance of the two-layer optical film, a data selecting device for selectively reading out the reflectance data corresponding to the measuring wavelengths for measured values of spectral reflectance and a film thickness deciding means for determining thickness of each layer of the two-layer optical film on the basis of the selected reflectance data and the measured spectral reflectance. This optical film thickness measuring device is capable of quickly and accurately measuring thickness of each layer of two-layer optical films.

REFERENCES:
patent: 4208240 (1980-06-01), Latos
patent: 4555767 (1985-11-01), Case et al.
patent: 4676647 (1987-06-01), Kikkawa et al.
patent: 4787749 (1988-11-01), Ban et al.
Tang et al., "Automatic Design of Optical Thin-Film Systems-Merit Function and Numerical Optimization Method", J. Opt. Soc. Am./vol. 72, No. 11, Nov., 1982, pp. 1522-1527.
Dobrowolski, "Completely Automatic Synthesis of Optical Thin Film Systems", Applied Optics vol. 4, No. 8, Aug., 1965, pp. 937-946.

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