Optical film measuring device

Details Optical film measuring device Optical film measuring device

2007-10-30

2007-10-30

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Dimension

Thickness

C356S402000, C382S141000, C382S145000, C250S559270

Reexamination Certificate

active

10798785

ABSTRACT:
Light emitted from a light source (22) is used through a light projection optical system (23) to perform coaxial down-emission lighting on a measurement target (36). Light reflected by the measurement target (36) is formed on a photo-detector (26) through an image formation optical system (24). Along its optical path, a spectroscope (25) is provided for converting an image impinging on the photo-detector (26) into a spectroscopic image having a predetermined wavelength band. A measurement point extraction portion (32) in a signal processing portion (28) determines a predeterm film thickness measurement point from an image picked up by the photo-detector (26), extracts an image signal at the film thickness measurement point, and transmits t to film thickness operation portion (33). The film thickness operation portion (33) measured film thickness of a thin film, which is the measurement target (36), from this signal.

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patent: 57052806 (1982-03-01), None
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patent: WO 03025497 (2003-03-01), None
patent: WO 03040771 (2003-05-01), None

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