Optical fiber block photo mask for loss reduction

Details Optical fiber block photo mask for loss reduction Optical fiber block photo mask for loss reduction

2005-02-01

2005-02-01

Bovernick, Rodney (Department: 2874)

Optical waveguides

With optical coupler

With alignment device

C385S147000, C430S005000

Reexamination Certificate

active

06850676

ABSTRACT:
A photomask is disclosed for the fabrication of an optical fiber block including a first section provided with slit arrays adapted to form an optical fiber alignment region of the optical fiber block while having a uniform slit pitch, partition portions arranged between adjacent ones of the slit arrays while having a pitch larger than the slit pitch, and end portions arranged outside the slit arrays while having a pitch larger than the slit pitch. The photomask also includes a second section adapted to form a stress-reducing recessed region of the optical fiber block etched to a desired depth from the level of the optical fiber alignment region. The photomask also includes auxiliary slit arrays arranged at an interface between the first and second sections. The auxiliary slit array includes at least one slit.

REFERENCES:
patent: 5632908 (1997-05-01), Shahid
patent: 6544695 (2003-04-01), Wang et al.
patent: 58130310 (1983-08-01), None

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