Optical exposure apparatus and method for aligning a substrate

Details Optical exposure apparatus and method for aligning a substrate Optical exposure apparatus and method for aligning a substrate

2006-01-24

2006-01-24

Ward, John Anthony (Department: 2875)

Illumination

With polarizer

C362S268000, C349S124000, C359S487030

Reexamination Certificate

active

06988811

ABSTRACT:
A system for processing a multilayer liquid crystal film display material, with multiple irradiation apparatus (60) for applying a zone of polarized UV irradiation onto a substrate fed from a web (16) with incident light at a desired angle. Each irradiation apparatus (60) includes a UV light source (64), and one or more optional filters (82). A polarizer (90) is provided, sized and arranged to polarize light over the web (16) as it moves. The irradiation apparatus (60) employs an array of louvers (81) and/or a prism array (72). One irradiation apparatus (60) irradiates a first LPP1layer (22) at a 0-degree alignment, in the web movement direction, the other irradiation apparatus (60) irradiates an LPP2layer (26) with an orthogonal 90-degree alignment.

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