Optical exposure apparatus

Photocopying – Projection printing and copying cameras – Illumination systems or details

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356172, 250491, G01B 1126, G03B 2754

Patent

active

040573478

ABSTRACT:
An improved optical exposure apparatus for use in exposing a workpiece to a desired light pattern with a high alignment accuracy and a high operational speed is disclosed. The apparatus comprises a moving table on which a workpiece to be exposed is disposed, a movable holder on which a mask having an original pattern is disposed, a light source for irradiating said mask, a reduction lens for projecting a reduced pattern of said original pattern onto said workpiece, means for positioning said moving table to a predetermined position, means for detecting the error of said table positioning, means for calculating a value of the error of positioning the workpiece divided by the reduction rate of the reduction lens, and means for automatically shifting said movable holder by the calculated value so as to cancel said error.

REFERENCES:
patent: 3207904 (1965-09-01), Heinz
patent: 3704946 (1972-12-01), Brault et al.
patent: 3843916 (1974-10-01), Trotel et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Optical exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical exposure apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-227303

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.