Optical error minimization in a semiconductor manufacturing...

Details Optical error minimization in a semiconductor manufacturing... Optical error minimization in a semiconductor manufacturing...

2005-04-26

2005-04-26

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S052000, C355S067000

Reexamination Certificate

active

06885436

ABSTRACT:
Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical errors, such as those resulting from gravitational sag on a reticle or mask, for a pattern being projected onto a wafer. The reduced errors allow larger reticles and masks to be used—while maintaining optical accuracy; and also improve optical budget management.

REFERENCES:
patent: 5883703 (1999-03-01), Knirck et al.
patent: 6480260 (2002-11-01), Donders et al.
patent: 20020145714 (2002-10-01), Hirayanagi
patent: 20030179354 (2003-09-01), Araki et al.
patent: 20030234915 (2003-12-01), Hickman

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