Optical enhancement of integrated circuit photodetectors

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device

Reexamination Certificate

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C257S292000, C257S432000, C257SE33076

Reexamination Certificate

active

10984670

ABSTRACT:
A semiconductor integrated circuit structure and method for fabricating. The semiconductor integrated circuit structure includes a light sensitive device integral with a semiconductor substrate, a cover dielectric layer disposed over the light sensitive device, and a lens-formation dielectric layer disposed over the cover dielectric layer. Light is transmittable though the cover dielectric layer; and through the lens-formation dielectric layer. The lens-formation dielectric layer forms an embedded convex microlens. The microlens directs light onto the light sensitive device.

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patent: 2006/0057765 (2006-03-01), Hsu et al.
patent: 1626442 (2006-02-01), None
patent: 62023161 (1987-01-01), None
patent: 2003338613 (2003-11-01), None

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