Optical emission spectroscopy process monitoring and...

Details Optical emission spectroscopy process monitoring and... Optical emission spectroscopy process monitoring and...

2007-03-21

2009-10-06

Evans, F. L (Department: 2877)

Optics: measuring and testing

With plural diverse test or art

C356S318000

Reexamination Certificate

active

07599048

ABSTRACT:
Methods and systems for control and monitoring processing of semiconductor materials with a focused laser beam. Laser light may be focused on a sample to excite optical emission at the sample surface during processing, which may include laser processing. Optical emission spectra produced may be analyzed for various properties effectively during the process. For example, process effects such as chemical composition analysis, species concentration, depth profiling, homogeneity characterization and mapping, purity, and reactivity may be monitored by optical spectral analysis. The wavelength may be selected to be appropriate for the process effect chosen.

REFERENCES:
patent: 6532068 (2003-03-01), Detalle et al.
patent: 6873419 (2005-03-01), Detalle et al.
patent: 7440097 (2008-10-01), Benicewicz et al.

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