Optical element with an optical axis

Optics: measuring and testing – Range or remote distance finding – With photodetection

Reexamination Certificate

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Reexamination Certificate

active

10489030

ABSTRACT:
The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2′) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2′) is designed to apply a force in said extension (2, 2′).

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patent: 198 25 716 (1999-12-01), None
patent: 198 27 603 (1999-12-01), None
patent: 198 59 634 (2000-06-01), None
patent: 0 938 009 (1999-08-01), None
patent: 2000-114143 (2000-04-01), None

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