Optical element, production method of optical element, optical s

Details Optical element, production method of optical element, optical s Optical element, production method of optical element, optical s

1995-03-07

1996-12-03

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 34, 359619, G21K 500, G21K 106

Patent

active

055816053

ABSTRACT:
An optical element for X-ray reflection according to the present invention is provided with a number of fine convex surfaces or concave surfaces regularly arranged on a substrate. Multilayer films reflecting X-rays are formed over the convex surfaces or concave surfaces. The convex surfaces or concave surfaces have such a shape that when X-rays enter each concave surface or convex surface, they are reflected with a certain diverging angle by the multilayer films and as a result that a plurality of secondary X-ray sources having the diverging angle are formed on a same plane located a certain distance apart from the concave surfaces or convex surfaces. By this, a number of secondary X-ray sources are formed to enable uniform irradiation of X-rays in a wide region.

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patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5222112 (1993-06-01), Terasawa
G. D. Kubiak et al., "Diffraction-limited soft x-ray projection lithography with a laser plasma source", J. Vac. Sci. Technol., vol. B9(6), pp. 3184-3188, Nov./Dec. 1991.
William C. Sweatt, "High-Efficiency Condenser Design for Illuminating a Ring Field", OSA Proceedings on Soft X-Ray Projection Lithography, vol. 18, pp. 70-72 (1993).
D. P. Gaines et al., "X-Ray Characterization of a Three-Element Condenser System for SXPL", OSA Proceedings on Soft X-Ray Projection Lithography, vol. 18, pp. 66-69 (1993).
J. E. Bjorkholm et al., "Reduction imaging at 14 nm using multilayer-coated optics: Printing of Features smaller than 0.1 .mu.m", J. Vac. Sci. Technol., vol. B8(6), pp. 1509-1513 Nov./Dec. 1990.
H. Kinoshita et al., "Soft X-Ray reduction lithography using multilayer mirrors", J. Vac. Technol., pp. 1648-1651 Nov./Dec. 1989.
Andrew M. Hawryhek et al., "Soft X-ray projection lithography using an x-ray reduction camera", J. Vac. Sci. Technol., vol. B6(6), pp. 2162-2166 Nov./Dec. 1988.

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