X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1996-11-22
1998-08-25
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 82, G21K 106
Patent
active
057990565
ABSTRACT:
This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.
REFERENCES:
patent: 4525853 (1985-07-01), Keem et al.
Church Craig E.
Ovonic Synthetic Materials Company Inc.
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