Optical element, method of producing optical elements,...

Details Optical element, method of producing optical elements,... Optical element, method of producing optical elements,...

2006-11-21

2006-11-21

Pak, Sung (Department: 2874)

Optical waveguides

Planar optical waveguide

C385S131000, C385S144000, C385S145000

Reexamination Certificate

active

07139460

ABSTRACT:
A method of producing optical elements using a substrate having a recess, which is capable of easily removing a film in the recess, and optical elements formed. The optical element comprises a substrate1, an optical waveguide structure layer10of resin disposed in a part of the region on the substrate1, and a recess21formed in the region where the optical waveguide structure layer10is not disposed. The optical waveguide structure layer10includes an optical waveguide4and a clad layer. A coupler layer is disposed between the substrate1and the optical waveguide structure layer10, and the film thickness distribution range of the coupler layer in the region below the optical waveguide4is such that the minimum film thickness is not more than 30 angstroms and the maximum film thickness is not less than 20 angstroms.

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Japanese Office Action for Application No. 2003-500616, dispatched Mar. 15, 2005, and English translation thereof (9 pp.).

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