Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1997-10-02
2000-09-19
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430321, 430394, 356399, 356401, H01L 2130
Patent
active
061209503
ABSTRACT:
An optical element manufacturing method includes a first process for forming a mask pattern on a substrate, and a second process for forming a step-like structure on the substrate by use of the mask pattern, wherein the first and second processes are repeated N times, and wherein, before execution of the (k)th time second process where 2.ltoreq.k.ltoreq.N, there is a process for determining a relative alignment error between a mask pattern as formed through the (k)th time first process and a mask pattern as formed through the (k-1)th time first process, and wherein the height of the step-like structure to be defined by the (k)th time second process is determined in accordance with the alignment error.
REFERENCES:
patent: 4440493 (1984-04-01), Hiraga
patent: 4774158 (1988-09-01), Vervoordeldonk et al.
patent: 4895790 (1990-01-01), Swanson et al.
patent: 5156943 (1992-10-01), Whitney
patent: 5161059 (1992-11-01), Swanson et al.
patent: 5218471 (1993-06-01), Swanson et al.
patent: 5503959 (1996-04-01), Langston
patent: 5631762 (1997-05-01), Kataoka
patent: 5663016 (1997-09-01), Hong
M.B. Stern, et al., "Fabricating Binary Optics: Process Variables Critical to Optical Efficiency," Journal of Vacuum Science and Technology: Part B, vol. 9, No. 6, Nov. 1, 1991, pp. 3117-3121.
T.J. Suleski, et al., "Gray-Scale Masks for Diffractive-Optics Fabrication: I. Commercial Slide Imagers," Applied Optics, vol. 34, No. 32, Nov. 10, 1995, pp. 7507-7517.
D.C. O'Shea, et al., "Gray-Scale Masks for Diffractive-Optics Fabrication: II. Spatially Filtered Halftone Screens," Applied Optics, vol. 34, No. 23, Nov. 10, 1995, pp. 7518-7526.
G.J. Swanson, "Binary Optics Technology: The Theory and Design of Multi-Level Diffractive Optical Elements," Massachusetts Institute of Technology Lincoln Laboratory, Technical Report 854, pp 1-47 (Aug. 1989).
G.J. Swanson, "Binary Optics Technology: Theoretical Limits on the Diffraction Efficiency of Multilevel Diffractive Optical Elements," Massachusetts Institute of Technology Lincoln Laboratory, Technical Report 914, pp 1-27 (Mar. 1991).
Ismail, K., "A Novel Mathod for Submicron . . . " Microelectronic Engineering I (1983) 295-300.
Angebranndt Martin
Canon Kabushiki Kaisha
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