Optical element, lithographic apparatus comprising such...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C355S053000, C359S452000

Reexamination Certificate

active

07034923

ABSTRACT:
An optical element includes a substrate having at least one surface on which a layer of material is disposed, the layer of material being selected to be at least partially transmissive to radiation with a predetermined wavelength λ. The surface of material includes particles having a diameter in a range of 1–500 nm and the layer of material has a layer thickness in the range of 10–2000 nm. Undesired radiations, e.g. UV and DUV radiations, are substantially reduced or eliminated by scattering, e.g. Mie scattering and/or Raleigh scattering, and/or by absorption by the particles while desired radiations are transmitted to the surface of the optical element.

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Lohmann, M., et al., Structural Investigations on Ultrathin Mo Layers in a-Si:H with Emphasis on the Island-Continuous Layer Transition, Thin Solid Films 342 (1999), pp. 127-135.
European Search Report for EP 05 07 5155 dated Apr. 12, 2005.

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