Optical element having antireflection film, and exposure...

Details Optical element having antireflection film, and exposure... Optical element having antireflection film, and exposure...

2006-11-08

2009-02-17

Allen, Sephone B. (Department: 2872)

Optical: systems and elements

Having significant infrared or ultraviolet property

Multilayer filter or multilayer reflector

C359S580000, C359S586000, C355S071000

Reexamination Certificate

active

07492510

ABSTRACT:
An optical element includes a substrate that transmits a light having a central wavelength in a wave range between 150 nm and 250 nm, and an n-layer antireflection film that is formed on the substrate, and includes, from the substrate, an n−2-th layer made of a high refractive index material, an n−1-th layer made of an amorphous material containing AlF3, and an n-th layer made of a low refractive index material, each of the high and low refractive index materials containing a crystalline material.

REFERENCES:
patent: 2391595 (1945-12-01), Richards et al.
patent: 7301695 (2007-11-01), Otani et al.
Otani et al., Development of optical coating for 157-nm lithography. II. Reflectance, absorption, and scatter measurement, Applied Optics, vol. 41, No. 16, Jun. 1, 2002, pp. 3248-3255, Optical Society of America.

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