Optical element and exposure apparatus

Optics: image projectors – Temperature control – Means to preheat slides or film

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07993008

ABSTRACT:
An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.

REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 3706485 (1972-12-01), Fawcett et al.
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4390273 (1983-06-01), Loebach et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4500611 (1985-02-01), Nickol et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 4568140 (1986-02-01), van der Werf et al.
patent: 4954372 (1990-09-01), Sako et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5067781 (1991-11-01), Montanari et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5139879 (1992-08-01), Aharoni et al.
patent: 5494743 (1996-02-01), Woodard et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5610689 (1997-03-01), Kamiya et al.
patent: 5648860 (1997-07-01), Ooi et al.
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5882773 (1999-03-01), Chow et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 5962079 (1999-10-01), Koberstein et al.
patent: 5993898 (1999-11-01), Nagatsuka
patent: 6084846 (2000-07-01), Jordache et al.
patent: 6166855 (2000-12-01), Ikeyama et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6236634 (2001-05-01), Lee et al.
patent: 6417974 (2002-07-01), Schuster
patent: 6466365 (2002-10-01), Maier et al.
patent: 6556353 (2003-04-01), Omura
patent: 6560032 (2003-05-01), Hatano
patent: 6574039 (2003-06-01), Murata et al.
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6628574 (2003-09-01), Shimazaki et al.
patent: 6633365 (2003-10-01), Suenaga
patent: 6795167 (2004-09-01), Ota et al.
patent: 6867844 (2005-03-01), Vogel et al.
patent: 6914665 (2005-07-01), Ishikawa
patent: 6952253 (2005-10-01), Lof et al.
patent: 6954256 (2005-10-01), Flagello et al.
patent: 7009682 (2006-03-01), Bleeker
patent: 7050146 (2006-05-01), Duineveld et al.
patent: 7075616 (2006-07-01), Derksen et al.
patent: 7081943 (2006-07-01), Lof et al.
patent: 7129009 (2006-10-01), French et al.
patent: 7193232 (2007-03-01), Lof et al.
patent: 7199858 (2007-04-01), Lof et al.
patent: 7209292 (2007-04-01), Epple et al.
patent: 7326522 (2008-02-01), Dierichs
patent: 7359030 (2008-04-01), Simon et al.
patent: 7393469 (2008-07-01), Benrashid et al.
patent: 7394521 (2008-07-01), Van Santen et al.
patent: 7460206 (2008-12-01), Weissenrieder et al.
patent: 7545481 (2009-06-01), Streefkerk et al.
patent: 7589818 (2009-09-01), Mulkens et al.
patent: 2001/0043320 (2001-11-01), Kato et al.
patent: 2002/0005990 (2002-01-01), Watanabe
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2003/0137733 (2003-07-01), Gerhard et al.
patent: 2003/0142409 (2003-07-01), Ohtsu et al.
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0021844 (2004-02-01), Suenaga
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0230592 (2004-11-01), Fischer et al.
patent: 2005/0007567 (2005-01-01), Pierrat et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0068639 (2005-03-01), Pierrat et al.
patent: 2005/0094119 (2005-05-01), Loopstra et al.
patent: 2005/0100745 (2005-05-01), Lin et al.
patent: 2005/0213066 (2005-09-01), Sumiyoshi
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2005/0225738 (2005-10-01), Shirai
patent: 2005/0237504 (2005-10-01), Nagasaka et al.
patent: 2005/0248856 (2005-11-01), Omura et al.
patent: 2006/0023183 (2006-02-01), Novak et al.
patent: 2006/0087725 (2006-04-01), Arriola
patent: 2006/0203218 (2006-09-01), Shirai et al.
patent: 2006/0209285 (2006-09-01), Shirai
patent: 2007/0188879 (2007-08-01), Ikezawa et al.
patent: 2007/0201011 (2007-08-01), Kokubun et al.
patent: 2008/0030698 (2008-02-01), Novak et al.
patent: 2008/0068573 (2008-03-01), Omura et al.
patent: 206 607 (1982-06-01), None
patent: 242 880 (1983-01-01), None
patent: DD 221 563 (1985-04-01), None
patent: DD 224 448 (1985-07-01), None
patent: 35 37 626 (1986-04-01), None
patent: 0 023 231 (1981-02-01), None
patent: 0 418 427 (1991-03-01), None
patent: 0 605 103 (1994-07-01), None
patent: 0 834 773 (1998-04-01), None
patent: 1 039 511 (2000-09-01), None
patent: 1 152 263 (2001-11-01), None
patent: 1 172 670 (2002-01-01), None
patent: 1 316 849 (2003-06-01), None
patent: 1 420 302 (2004-05-01), None
patent: 1 429 190 (2004-06-01), None
patent: 1 510 871 (2005-03-01), None
patent: 1 571 700 (2005-09-01), None
patent: 1 646 074 (2006-04-01), None
patent: 2 474 708 (1980-01-01), None
patent: A-57-153433 (1982-09-01), None
patent: A 58-202448 (1983-11-01), None
patent: A 59-19912 (1984-02-01), None
patent: A 62-65326 (1987-03-01), None
patent: A-62--121417 (1987-06-01), None
patent: A-62-121417 (1987-06-01), None
patent: A 63-157419 (1988-06-01), None
patent: A 04-305915 (1992-10-01), None
patent: A 04-305917 (1992-10-01), None
patent: A 05-062877 (1993-03-01), None
patent: A 06-124873 (1994-05-01), None
patent: A-7-132262 (1995-05-01), None
patent: A 07-220990 (1995-08-01), None
patent: 08-316125 (1996-11-01), None
patent: A-10-154659 (1998-06-01), None
patent: A 10-163099 (1998-06-01), None
patent: A 10-214783 (1998-08-01), None
patent: A-10-228661 (1998-08-01), None
patent: A-10-255319 (1998-09-01), None
patent: A-10-303114 (1998-11-01), None
patent: A 10-303114 (1998-11-01), None
patent: A 10-340846 (1998-12-01), None
patent: A 11-176727 (1999-07-01), None
patent: A-11-264903 (1999-09-01), None
patent: A 2000-058436 (2000-02-01), None
patent: A-2000-131503 (2000-05-01), None
patent: A 2000-505958 (2000-05-01), None
patent: A-2001-91849 (2001-04-01), None
patent: A-2002-244035 (2002-08-01), None
patent: A-2004-193252 (2004-07-01), None
patent: A 2004-207711 (2004-07-01), None
patent: A 2004-259966 (2004-09-01), None
patent: WO 98/28665 (1998-07-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 02/093209 (2002-11-01), None
patent: WO 03/077034 (2003-09-01), None
patent: WO 03/077036 (2003-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/053596 (2004-06-01), None
patent: WO 2004/053950 (2004-06-01), None
patent: WO 2004-053951 (2004-06-01), None
patent: WO 2004/053953 (2004-06-01), None
patent: WO 2004/053954 (2004-06-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2004/053957 (2004-06-01), None
patent: WO 2004/053958 (2004-06-01), None
patent: WO 2004/053959 (2004-06-01), None
patent: WO 2004/0503952 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004-107048 (2004-12-01), None
M. Switkes et al., Immersion Liquids for Lithography in the Deep Ultraviolet, Optical Microlithography XVI, 2003, 690-699, vol. 5040 (2003).
M. Switkes et al., “Immersion Lithography at 157 nm,” J. Vac. Sci. Technol. B., vol. 19, No. 6, Nov./Dec. 2001, pp. 2353-2356.
B.J. Lin, “Proximity Printing Through Liquid,” IBM Technical Disclosure Bulletin, vol. 20, No. 11B, Apr. 1978, p. 4997.
B.J. Lin, “The Paths to Subhalf-Micrometer Optical Lithography,” SPIE vol. 922, Optical/Laser Microlithography (1998), pp. 256-269.
G.W.W. Steve

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Optical element and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical element and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical element and exposure apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2745578

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.