Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-03-03
1987-06-30
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118712, 118715, 20419213, 356382, 356435, C23C 1400
Patent
active
046768831
ABSTRACT:
An optical transmission monitor for determining the optical transmissivity and thickness of films deposited on a substrate. A monitor substrate in the form of a rotating disk exposed to the deposition process is used. An optical system for measuring the transmissivity of the disk obstructs a fixed segment of the rotating disk so that the film thickness on the monitor disk is a known fraction of the film on the substrate being processed.
REFERENCES:
patent: 3744916 (1973-07-01), Bey et al.
patent: 3853093 (1974-12-01), Baker et al.
patent: 4024291 (1977-05-01), Wilmanns
patent: 4207835 (1980-06-01), Schwieker
patent: 4569717 (1986-02-01), Ohgami
patent: 4582431 (1986-04-01), Cole
Lucky Clyde L.
Nelson Roger E.
Demers Arthur P.
Epstein Saul
Sierracin Corporation
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