Optical differential profile measurement apparatus and process

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356360, G01B 902

Patent

active

057841632

ABSTRACT:
An interferometer forms a pair of projected sub-beams by decomposing a single coherent, linearly-polarized beam. These sub-beams are focussed by an objective lens onto a pair of test spots on a test surface. The reflections of these sub-beams are recombined to form an elliptically polarized return beam, which is broken into return sub-beams of opposing polarities in a polarizing beam splitter. The intensities of these return sub-beams are used to calculate a difference in height between the two test spots. When these test spots are aligned along a path of relative motion with the test surface, the resulting differences in height are added to form an accumulative profile of the test surface.

REFERENCES:
patent: 4298283 (1981-11-01), Makosch et al.
patent: 4320973 (1982-03-01), Fortunato et al.
patent: 4534649 (1985-08-01), Downs
patent: 4770532 (1988-09-01), Ito
patent: 4844616 (1989-07-01), Kulkarne et al.
patent: 5122648 (1992-06-01), Cohen et al.
patent: 5469259 (1995-11-01), Golby et al.
patent: 5557399 (1996-09-01), de Groot
T. Bayer and G. Makosch, Photolithgraphic Process Control by Optical Phase Monitoring of Latent Images in Photoresist, IBM Tech. Disclosure Bulletin, vol.34, No. 10A, Mar., 1992, pp. 140-143.
U. Frank-Schmidt and G. Makosch, Interferometric Method of Checking the Overlay Accuracy in Photolithographic Exposure Processes, IBM Tech. Disclosure Bulletin, vol. 32, No. 10B, Mar. 1990, pp. 214-217.
G. Makosch, System for Stepless Beam Splitting, IBM Tech. Disclosure Bulletin, vol. 30, No.11, Apr. 1988, pp. 249-250.
H. Korth and F. Schedwie, Analyzing Optical Phase Structures, IBM Tech. Disclosure Bulletin, vol. 24, No. 6. Nov., 1981, pp. 3094-3095.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Optical differential profile measurement apparatus and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical differential profile measurement apparatus and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical differential profile measurement apparatus and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1651789

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.