Optical device with enhanced mechanical stability operating...

Optical: systems and elements – Light interference – Produced by coating or lamina

Reexamination Certificate

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C359S350000, C359S582000, C359S586000

Reexamination Certificate

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07012753

ABSTRACT:
An optical device reflecting a range of wavelengths comprised between 10 nm and 20 nm comprises alternate superposed first and second layers. The first layers are made of metal or metallic compound and the second layers are formed by an amorphous silicon compound chosen from a-Si—Hx, a-Si—CHx, a-Si—Cx, a-Si—OHx, a-Si—Fx, a-Si—FHx, a-Si—Nx, a-Si—NHx, x being comprised between 0.01 and 0.3. The use of second layers of amorphous silicon compound enables the mechanical stresses of the optical device to be stabilized up to at least 200° C. The optical device is preferably used as reflector for a lithography mask in the extreme ultraviolet (EUV).

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patent: 2002/0014403 (2002-02-01), Hoshino
Amorphous silicon carbide coatings for extreme ultraviolet optics, Applied Optics, vol. 27, No. 14, Kortfight et al ,pp. 2841-2846.
Drüsedau et al. “The Hydrogenated Amorphous Silicon/Nanodisperse Metal (Simal) System—Films of Unique Electronic Properties,” Journal of Non-Crystalline Solids 198-200 (1996) 829-832.
Kim et al. “Annealing Effects on a-SiC:H and a-SiC:H(F) Thin Films Deposited by PECVD at Room Temperature,” Thin Solid Films 261 (1995) 192-201.

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