Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-01-11
2005-01-11
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298250, C118S728000, C118S729000, C118S732000, C118S719000, C118S724000, C118S500000, C269S021000
Reexamination Certificate
active
06841049
ABSTRACT:
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support surface is provided to the holder section which closely contacts at least a portion of the surface of the optical disk substrate rear to the surface where the think film is formed.
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Aman Yasutomo
Deguchi Hiroshi
Hanaoka Katsunari
Ito Kazunori
Miura Hiroshi
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