Optical device having stress layer inducing refraction index...

Optical waveguides – Optical waveguide sensor – Including physical deformation or movement of waveguide

Reexamination Certificate

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C385S129000, C385S130000, C385S131000, C385S132000

Reexamination Certificate

active

07729568

ABSTRACT:
The application relates to an optical device for enhancing the stress to be generated in a substrate in comparison with a conventional technique. To this end, the optical device includes a substrate having a photoelastic effect, a first stress layer formed on a first face of the substrate and having a pattern for generating stress which induces refraction index variation by the photoelastic effect in a partial region in the substrate, and a second stress layer formed on a second face which is a reverse face to the first face of the substrate and configured to generate stress for restoring the shape from the deformation caused by the stress generated in the substrate by the first stress layer in the substrate.

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K. Saitoh, et al., “Stress Analysis Method for Elastically Anisotropic Material Based Optical Waveguides and its Application to Strain-Induced Optical Waveguides”, Journal of Lightwave Technology, vol. 17, No. 2, pp. 255-259, Feb. 1999.
O. Eknoyan, et al., “Strain Induced Optical Waveguides in Lithium Niobate, Lithium Tantalate, and Barium Titanate”, Appl. Phys. Lett. 60 (4), pp. 407-409, Jan. 27, 1992.
International Search Report mailed May 16, 2006 for International Application No. PCT/JP2006/302651.

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