Optical device having a quantum-dot structure

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is

Reexamination Certificate

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C257SE31033, C438S962000

Reexamination Certificate

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07968863

ABSTRACT:
Method of manufacturing an optical device, and an optical device, the optical device having one or more layers (13) of quantum-dots located in-between barrier layers (12). A spacer layer (15) is grown on a barrier layer (12), such that the spacer layer (15) is adapted for substantially blocking strain fields induced by quantum-dot layers, thereby producing a smooth growth front for a subsequent barrier layer (12).

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patent: 2007/0210300 (2007-09-01), Kawaguchi
patent: 2009/0315019 (2009-12-01), Lelarge et al.
Mikkelsen et al.: “Cross-sectional scanning tunneling microscopy studies of novel III-V semiconductor structures” Progress in Surface Science, Oxford, GB, vol. 80, No. 1-2, Jan. 1, 2005.
Levesque et al: “Self-organization of InAs/InP quantum dot multilayers: pseudophase diagram describing the transition from aligned to antialigned structures” Physical Review Letters American Physical Society USA, vol. 100, No. 4, Feb. 1, 2008.
Ouattara et al.: “Correlation Lengths in 1-18 stacked InAs quantum dot systems studied by cross-sectional scanning tunneling microscopy” Nanotechnology IOP Publishing UK, vol. 18, No. 14, Apr. 11, 2007.
European Search Report dated Nov. 26, 2008.

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