Optical device and method of manufacturing the same

Optical waveguides – Planar optical waveguide

Reexamination Certificate

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C385S130000, C385S131000, C385S012000, C385S141000, C438S029000, C438S031000, C359S346000

Reexamination Certificate

active

10545157

ABSTRACT:
An optical device comprising a substrate, a porous layer laid on the substrate having a pore diameter smaller than the wavelength of light and a crystal layer laid on the porous layer showing a refractive index greater than that of the porous layer is presented. The optical device is manufactured by a method comprising a step of forming a porous layer having a pore diameter smaller than the wavelength of light on the surface of a substrate and a step of forming a crystal layer showing a refractive index greater than that of the porous layer on the porous layer. Since the porous layer is clad, light can be confined with ease.

REFERENCES:
patent: 5682401 (1997-10-01), Joannopoulos et al.
patent: 2002/0089620 (2002-07-01), Yamamoto et al.
patent: 2003/0036085 (2003-02-01), Salinaro et al.
patent: 2003/0203284 (2003-10-01), Iriguchi et al.
patent: 2006/0147169 (2006-07-01), Sugita et al.
patent: 2006/0193552 (2006-08-01), Sugita
patent: 100 14 723 (2001-09-01), None
patent: 101 23 137 (2002-10-01), None
patent: 2000-144276 (2000-05-01), None
patent: 2002-299153 (2002-10-01), None
Arrand, et al., “The Application of Porous Silicon to Optical Waveguide Technology,” Journal of Selected Topics in Quantum Electronics, vol. 4, No. 6, pp. 975-985 (Nov. 1998).
St. John et al., “Characterization of Erbium Doped SiO2Layers Formed on Silicon by Spark Processing,” Mat. Res. Soc. Symp. Proc. vol. 486, pp. 281-286 (Dec. 1998).
Arrand, et al., “Solvent Detection Using Porous Silicon Optical Waveguides,” Journal of Luminescence, vol. 80, No. 1-4, pp. 119-123 (Dec. 1998).
Uehara, et al., “Porous Silicon Refractive Index Lattices”, Phys. Stat. Sol. vol. 182, No. 1, pp. 443-446, (Nov. 2000).
Skryshevsky, “Thin Film PV Module,”, Thin Solid Films, Elsevier-Sequoia S.A. Lausanne, CH, vol. 368, No. 1, pp. 125-129 (Jun. 2000).
Topol'ancik, et al., “Fluid Detection With Photonic Crystal-Based Multichannel Waveguides”, Appl. Phys. Lett., vol. 82, No. 8, pp. 1143-1145 (Feb. 2003).
Yablonovitch, “Inhibited Spontaneous Emission in Solid-State Physics and Electronics,” The American Physical Society, vol. 58, No. 20, pp. 2059-2062 (May 18, 1987).
Wada, K., “Photonic Crystal Technology and its Applications,” Silicon Microphotonics, Chapter 19, pp. 252, 257 and 258 CMC Publishing (2002).
Koshiba, M., “Optical Waveguide Analysis,” Guided Mode in Optical Waveguide, Chapter 3, pp. 34-35, Asakura-Shoten (1990).
Natomi, M., “Photonic Crystal Slabs Using SOI Slabs,” Oyo-Butsuri (Applied Physics), vol. 72, No. 7, pp. 914-918 (2003).
Celler, G. et al., “Status Quo of SOI Wafers for MEMS,” Denshi-Zairyo (Electronic Material), pp. 27-31 (May 2002).

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