Optical device and method of manufacture

Details Optical device and method of manufacture Optical device and method of manufacture

2006-08-16

2008-10-14

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492300, C359S850000, C359S002000, C359S569000, C359S619000, C430S321000, C283S085000, C426S410000

Reexamination Certificate

active

07435979

ABSTRACT:
The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.

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