Optical determination of pattern feature parameters using a...

Optics: measuring and testing – Shape or surface configuration – By projection of coded pattern

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S625000

Reexamination Certificate

active

10859252

ABSTRACT:
Optical characterization of lateral features of a pattern is provided. A plane-wave optical response is calculated for each feature. At least one of these plane-wave responses is calculated from an effective optical property (e.g., a waveguide modal refractive index). Such effective optical properties depend on feature geometry and on intrinsic material optical properties. The plane-wave responses for each feature are combined to generate a modeled pattern response. By fitting the modeled pattern response to a corresponding measured pattern response, estimates for pattern feature parameters are obtained. The use of an effective optical property improves model accuracy, especially for features having a size on the order of a wavelength or less, without significantly increasing computation time.

REFERENCES:
patent: 4112309 (1978-09-01), Nakazawa et al.
patent: 5607800 (1997-03-01), Ziger
patent: 5861320 (1999-01-01), Shiraishi
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5900633 (1999-05-01), Solomon et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6100985 (2000-08-01), Scheiner et al.
patent: 6281974 (2001-08-01), Scheiner et al.
patent: 6327035 (2001-12-01), Li et al.
patent: 6340602 (2002-01-01), Johnson et al.
patent: 6433878 (2002-08-01), Niu et al.
patent: 6476920 (2002-11-01), Scheiner et al.
patent: 6483580 (2002-11-01), Xu et al.
patent: 6556947 (2003-04-01), Scheiner et al.
patent: 6590656 (2003-07-01), Xu et al.
patent: 6609086 (2003-08-01), Bao et al.
patent: 6623991 (2003-09-01), Johnson et al.
patent: 6657736 (2003-12-01), Finarov et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6891628 (2005-05-01), Li et al.
patent: 6900892 (2005-05-01), Shchegrov et al.
patent: 7084900 (2006-08-01), Watanabe et al.
patent: 2003/0058443 (2003-03-01), Xu et al.
Sang-Jun Cho et al., “Etch depth control in bulk GaAs using patterning and real time spectroscopic ellipsometry,” J. Vac. Sci. Technol. B 20(1), Jan./Feb. 2002, pp. 197-202.
M.E. Lee et al., “Analysis of Reflectometry and Ellipsometry Data from Patterned Structures,” Dept. of Electrical Engineering and Computer Science, Univ. of Mich., pp. 1-5.
Helen L. Maynard et al., “Multiwavelength ellipsometry for real-time process control of the plasma etching of patterned samples,” J. Vac. Sci. Technol. B 15(1), Jan./Feb. 1997 pp. 109-115.
Helen L. Maynard et al., “Thin-film interferometry of patterned surfaces,” J. Vac. Sci. Technol. B 13(3), May/Jun. 1995, pp. 848-857.
M.G. Moharam et al., “Formulation of stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings,” J. Opt. Soc. Am. A/vol. 12, No. 5/May 1995 pp. 1068-1076.
M.G. Moharam et al., “Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. A. vol. 12, No. 5/May 1995 pp. 1077-1086.
P.A. Heimann et al., “Optical Etch-Rate Monitoring: Computer Simulation of Reflectance,” J. Electrochem. Soc.: Solid-State Science and Technology, vol. 131, No. 4 pp. 881-885.
P.A. Heimann, “Optical Etch-Rate Monitoring Using Active Device Areas: Lateral Interference Effects,” J. Electrochem. Soc.: Solid-State Science and Technology, vol. 132, No. 8 pp. 2003-2006.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Optical determination of pattern feature parameters using a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical determination of pattern feature parameters using a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical determination of pattern feature parameters using a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3809227

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.