Optical compensation devices, systems, and methods

Details Optical compensation devices, systems, and methods Optical compensation devices, systems, and methods

2010-08-31

2011-11-22

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08062814

ABSTRACT:
Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second patterned region is formed on the substrate that is proximate to the first patterned region, the first patterned region and the second patterned region each having a plurality of optically transmissive and optically attenuating regions formed on the mask. An optical compensation region is positioned proximate to at least one of the first patterned region and the second patterned region that is configured to change a phase of the illumination radiation incident on the at least one of the first patterned region and the second region by altering an optical property of the substrate.

REFERENCES:
patent: 6528216 (2003-03-01), Park
patent: 6818357 (2004-11-01), Yan
patent: 7790338 (2010-09-01), Lei et al.
patent: 2007/0238032 (2007-10-01), Murano
patent: 2008/0284996 (2008-11-01), Lei et al.
Brunner, Timothy A., “Impact of Lens Aberrations on Optical Lithography”, IBM J. Res. Develop. 41(1/2), (Jan./Mar. 1997), pp. 57-67.

Affiliated with

Also associated with

Rating

Optical compensation devices, systems, and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical compensation devices, systems, and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical compensation devices, systems, and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4306972