Coating apparatus – Control means responsive to a randomly occurring sensed... – Sampling of associated base
Patent
1994-12-21
1996-04-16
Bueker, Richard
Coating apparatus
Control means responsive to a randomly occurring sensed...
Sampling of associated base
118712, 118715, C23C 1400
Patent
active
055078702
ABSTRACT:
A method is disclosed for specifying the ratios of three or more coating materials so as to specify and control the index of refraction profile, stress profile, and/or the coefficient of thermal expansion of an optical coating. Also disclosed is a coating deposition chamber (10) that includes an in-situ stress monitor (12) for measuring a stress within a coating (20). The output of the monitor is compared to predicted profiles and appropriate corrections are made to chamber constants. In a presently preferred embodiment, the in-situ stress monitor includes an interferometer having a sample beam (28a) that reflects from a surface of a substrate (22) upon which the coating is being formed. A change in the optical path length is indicative of a direction and magnitude of a substrate flexure due to stress induced in the coating. Responsive to the determined stress, coating chamber operating parameters are varied, if required, to maintain the stress at a desired magnitude and type.
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patent: 5154810 (1992-10-01), Kamerling
Martin, Appl. Phys. Lett. 58(22) Jun. 3, 1991, pp. 2497-2499.
Ennos, Stresses Developed in Optical Film Coatings, Applied Optics, vol. 5, No. 1, Jan. 1966.
Bueker Richard
Denson-Low W. K.
Hughes Aircraft Company
Schubert W. C.
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