Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2005-09-26
2008-08-19
Martinez, Joseph (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C359S358000, C359S665000, C250S201200, C355S056000
Reexamination Certificate
active
07414794
ABSTRACT:
An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.
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J. Microlith., Microfab., Microsyst., vol. 1 No. 3, Oct. 2002,
Martinez Joseph
Nikon Corporation
Oliff & Berridg,e PLC
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