Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Patent
1996-09-23
1999-07-20
Font, Frank G.
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
356338, 356337, 356445, G01J 2100
Patent
active
059262664
ABSTRACT:
Apparatus for inspecting the surface of a sample includes a wide scanning interferometer, which is used to locate defects, or anomalies in the surface, and a narrow scanning interferometer, which is used to develop profiles of individual defects found by the narrow scanning interferometer. The sample may be driven in rotation about an axis, while the interferometers are independently moved radially to the axis.
REFERENCES:
patent: 4298283 (1981-11-01), Makosch et al.
patent: 4320973 (1982-03-01), Fortunato et al.
patent: 4534649 (1985-08-01), Downs
patent: 4844616 (1989-07-01), Kulkarne et al.
patent: 5062021 (1991-10-01), Ranjan et al.
patent: 5108781 (1992-04-01), Ranjan et al.
patent: 5122648 (1992-06-01), Cohen et al.
patent: 5225886 (1993-07-01), Koizumi et al.
patent: 5289260 (1994-02-01), Miyazaki et al.
patent: 5293211 (1994-03-01), Bernard
patent: 5469259 (1995-11-01), Golby et al.
T. Bayer and G. Makosch, Photolithgraphic Process Control by Optical Phase Monitoring of Latent Images in Photoresist, IBM Tech. Disclosure Bulletin, vol. 34, No. 10A, Mar., 1992, pp. 140-143.
U. Frank-Schmidt and G. Makosch, Interferometric Method of Checking the Overlay Accuracy in Photolithographic Exposure Processs, IBM Tech. Disclosure Bulletin, vol. 32, No. 10B, Mar. 1990, pp. 214-217.
G. Makosch, System for Stepless Beam Splitting, IBM Tech. Disclosure Bulletin, vol. 30, No. 11, Apr. 1988, pp. 249-250.
H. Korth and F. Schedwie, Analyzing Optical Phase Structures, IBM Tech. Disclosure Bulletin, vol. 24, No. 6. Nov., 1981, pp. 3094-3095.
Dorundo Alan D.
Lisanke Michael Gerard
Lu Huizong
McCormick Richard J.
Pena Lanphuong Thi
Davidge Ronald V.
Font Frank G.
International Business Machines - Corporation
Ratliff Reginald A.
Tomlin Richard A.
LandOfFree
Optical apparatus for rapid defect analysis does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optical apparatus for rapid defect analysis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical apparatus for rapid defect analysis will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1326778