Optical alignment system for use in photolithography and having

Details Optical alignment system for use in photolithography and having Optical alignment system for use in photolithography and having

1988-05-13

1989-08-08

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

356400, G03B 2752

Patent

active

048557927

ABSTRACT:
A direct reticle reference alignment system for use in photolithography for use with substrates having optical transmissivity. The system includes a movable stage (14), a transmissive substrate (11) held by the stage and bearing at least one plate mark (15) upon its upper surface, an optical system having a light source (1) for illuminating and projecting a reticle alignment image (4) upon the substrate (11) for alignment with the plate mark (15), a sensor (17) mounted in the stage (14) below the substrate (11) and the plate mark (15) to receive light from the projected alignment image (4), the sensor (17) producing an electrical signal related to the degree of alignment, and a stage control actuated by the signal to position the stage (14) and, so, align the substrate (11) with the reticle (4). The sensor (17) includes a light channel (19), such as a fiber optic rod, positioned to receive images from the lower surface (13) of said substrate ( 11) and carry them to the photocell. The detector may include a quadcell and a corresponding light channel for each cell in the quadcell.

REFERENCES:
patent: 4540277 (1985-09-01), Mayer et al.
patent: 4623608 (1986-11-01), Andrevski
patent: 4629313 (1986-12-01), Tanimoto
patent: 4701053 (1987-10-01), Ikenaga
patent: 4711567 (1987-12-01), Tanimoto
patent: 4769680 (1988-09-01), Resor, III et al.

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