Optical alignment of masks for X-ray lithography

Details Optical alignment of masks for X-ray lithography Optical alignment of masks for X-ray lithography

1980-02-14

1982-11-23

McGraw, Vincent P.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356401, 350162ZP, G01B 902

Patent

active

043602738

ABSTRACT:
Optical alignment of the relative positions of cooperating masks and substrates is achieved for use in the generation by x-radiation of complex and compact patterns. Small fiduciary marks are actually illuminated by coherent visible light and the resultant diffraction patterns are used for alignment purposes. Fresnel half-period zone plates are used to produce interference patterns in the form of an operator-observable information bearing pattern on a viewable screen.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4113388 (1978-09-01), Gates et al.
patent: 4200395 (1980-04-01), Smith et al.
patent: 4211489 (1980-07-01), Kleinknecht et al.
patent: 4265542 (1981-05-01), Snow

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