Optical adjusting process

X-ray or gamma ray systems or devices – Photographic detector support – Dental

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350437, 378 34, G02B 2700

Patent

active

046419217

ABSTRACT:
The invention relates to an optical adjusting process for proximity printing wherein a mask is spaced at a short distance from a substrate on which an image of the mask structure is to be formed. According to the invention, a high-definition image of the structures of the mask and of the substrate is formed by means of light of differing wavelength in a common image plane. This adjusting process is intended, in particular, for X-ray lithography.

REFERENCES:
patent: 2244687 (1941-06-01), Goldsmith et al.
patent: 3035488 (1962-05-01), Alden
patent: 3588227 (1971-06-01), Yamamoto et al.
patent: 3892973 (1975-07-01), Coglin et al.
patent: 4453262 (1984-06-01), Buckley
Applied Optics, vol. 16, No. 3, Mar. 1977, pp. 549-550.
Applied Optics, vol. 12, No. 10, Oct. 1973, pp. 2509-2519.

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