Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-09-02
2008-09-02
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100, C356S237500
Reexamination Certificate
active
10543970
ABSTRACT:
Described herein is an optical probe (120) for use in characterizing surface defects in wafers, such as semiconductor wafers. The optical probe (120) detects laser light reflected from the surface (124) of the wafer (106) within various ranges of angles. Characteristics of defects in the surface (124) of the wafer (106) are determined based on the amount of reflected laser light detected in each of the ranges of angles. Additionally, a wafer characterization system (100) is described that includes the described optical probe (120).
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Hambarian Artak
Sopori Bhushan L.
Midwest Research Institute
Underwood Jarreas C
White Paul J.
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