Hazardous or toxic waste destruction or containment – Destruction or containment of radioactive waste
Patent
1994-02-18
1995-05-16
Mai, Ngoclan T.
Hazardous or toxic waste destruction or containment
Destruction or containment of radioactive waste
588 20, 62 451, 405 52, 405 80, 405128, 405130, G21F 904
Patent
active
054162572
ABSTRACT:
Treatment of flowable underground contaminants comprises freezing at least one open underground barrier volume to form a wall (10) near the contaminated region (12) in the ground (14), where the wall (10) is positioned to direct the contaminant flow (16) along a subsurface path (18) and allow concentration of the contaminants and their remediation.
REFERENCES:
patent: 3183675 (1965-05-01), Schroeder
patent: 3267680 (1966-08-01), Schlumberger
patent: 3559737 (1971-02-01), Ralstin
patent: 4597444 (1986-07-01), Hutchinson
patent: 4778628 (1988-10-01), Saha et al.
patent: 4860544 (1989-08-01), Krieg et al.
patent: 4966493 (1990-10-01), Rebhan
patent: 4974425 (1990-12-01), Krieg et al.
patent: 5050386 (1991-09-01), Krieg et al.
patent: 5324137 (1994-08-01), Dash
Iskander, "Effect of Freezing on the Level of Contaminants in Uncontrolled Hazardous Waste Sites," Special Reports 86-19, U.S. Army Corps of Engineers, pp. 1-33.
Sullivan, Jr. et al., "Comparison of Numerical Simulations with Experimental Data for a Prototype Artificial Ground Freezing," Proceedings of the International Symposium on Frozen Soil Impacts on Agriculture, Range, and Forest Lands, Special Report 90-1, pp. 36-43.
Cillo Daniel P.
Mai Ngoclan T.
Westinghouse Electric Corporation
LandOfFree
Open frozen barrier flow control and remediation of hazardous so does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Open frozen barrier flow control and remediation of hazardous so, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Open frozen barrier flow control and remediation of hazardous so will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-639079