Open-ended electromagnetic corrector assembly and method for...

Details Open-ended electromagnetic corrector assembly and method for... Open-ended electromagnetic corrector assembly and method for...

2009-09-04

2011-10-11

Kim, Robert (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S492210

Reexamination Certificate

active

08035087

ABSTRACT:
The present invention is an electromagnetic controller assembly for use in ion implantation apparatus, and provides a structural construct and methodology which can be employed for three recognizably separate and distinct functions: (i) To adjust the trajectory of charged particles carried within any type of traveling ion beam which is targeted at a plane of implantation or a work surface for the placement of charged ions into a prepared workpiece (such as a silicon wafer or flat glass panel); (ii) concurrently, to alter and change the degree of parallelism of the ions in the traveling beam; and (iii) concurrently, to control the uniformity of the current density along the transverse direction of traveling ion beams, regardless of whether the beams are high-aspect, continuous ribbon ion beams or alternatively are scanned ribbon ion beams.

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