Etching a substrate: processes – Forming or treating mask used for its nonetching function
Reexamination Certificate
2004-10-21
2008-12-02
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Forming or treating mask used for its nonetching function
C428S137000
Reexamination Certificate
active
07459095
ABSTRACT:
A substrate includes an opaque chrome coating on a surface of the substrate dry-etched to form an aperture, wherein chrome in the aperture is below detectable limit. A method of forming an opaque chrome coating having at least two layers on a substrate includes depositing an initial chrome layer having a thickness of less than 10 nm on the substrate without ion-assist or with undetectable ion-assist, and then depositing the remainder of the at least two layers, with or without ion-assist, to form an opaque chrome coating.
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Bellman Robert
Ukrainczyk Ljerka
Corning Incorporated
Douglas Walter M.
Olsen Allan
Schaeberle Timothy M.
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