Onsite chemistry air filtration system

Details Onsite chemistry air filtration system Onsite chemistry air filtration system

2009-12-10

2010-11-09

Smith, Duane (Department: 1797)

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

C096S022000, C096S018000, C096S019000, C096S063000, C096S223000, C422S120000, C422S121000, C422S122000, C422S186300, C423S210000, C095S273000

Reexamination Certificate

active

07828940

ABSTRACT:
An onsite chemistry air filtration system to remove gaseous contaminants from air is disclosed. The onsite chemistry air filtration system of the present invention comprises: a conventional particulate filtration section, a photochemical filtration section, a static gas phase filtration section and a catalytic filtration section. The conventional particulate filtration section captures solids and condensables. In the photochemical filtration section, UV lamps generate bio-destruction and surface photochemical activity on a semiconductor catalyst material, provide a radiation source to irradiate airborne contaminant molecules and to energize their states to promote reactions and generate airborne ozone and radicals. In the static gas phase filtration section, gas phase filtration media is used to capture contaminants, concentrate them in a relatively confined space and allow airborne generated chemistries to concentrate and react in-situ, thereby creating a regeneration effect on the media. In the catalytic filtration section, catalytic media scavenges and converts airborne radicals and ozone to harmless by-products.

REFERENCES:
patent: 3505989 (1970-04-01), Truhan
patent: 4256694 (1981-03-01), McAllister et al.
patent: 4684380 (1987-08-01), Leichnitz
patent: 4694179 (1987-09-01), Lew et al.
patent: 4963166 (1990-10-01), Hoyt et al.
patent: 5086804 (1992-02-01), Ngai
patent: 5430228 (1995-07-01), Ciambrone et al.
patent: 5564065 (1996-10-01), Fleck et al.
patent: 5616172 (1997-04-01), Tuckerman et al.
patent: 5935525 (1999-08-01), Lincoln et al.
patent: 6315963 (2001-11-01), Speer
patent: 6491883 (2002-12-01), Mort et al.
patent: 6500387 (2002-12-01), Bigelow
patent: 6752970 (2004-06-01), Schwartz et al.
patent: 6910445 (2005-06-01), Manthei et al.
patent: 7045096 (2006-05-01), D'Ottone
patent: 7332020 (2008-02-01), Tanaka et al.
patent: 2002/0139124 (2002-10-01), Palermo
patent: 2003/0133832 (2003-07-01), D'Ottone
patent: 2007/0193448 (2007-08-01), Tanaka et al.
patent: 2005/089908 (2005-09-01), None

Affiliated with

Also associated with

Rating

Onsite chemistry air filtration system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Onsite chemistry air filtration system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Onsite chemistry air filtration system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4237248