One-transistor adaptable analog storage element and array

Electrical transmission or interconnection systems – Nonlinear reactor systems – Parametrons

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Details

395 24, 365185, 307450, H03K 1908, H03K 19094

Patent

active

053369360

ABSTRACT:
An analog storage array according to the present invention is disposed on a semiconductor substrate. The array is arranged as a plurality of rows and a plurality of columns and includes a plurality of N-channel MOS transistors disposed in the rows and columns in a p-well in the semiconductor substrate. Each of the MOS transistors includes a source, a drain, and a floating gate forming a tunneling junction with a tunneling electrode. An input line is associated with each of the rows in the array. Each input line is connected to the source of each of the N-channel MOS transistors disposed in the row with which the input line is associated. A bias line is associated with each of the rows in the array. Each bias line is capacitively coupled to the floating gate of each of the N-channel MOS transistors disposed in the row with which the bias line is associated. A tunnel line is associated with each of the columns in the array. Each tunnel line connected to the tunneling electrode of each of the N-channel MOS transistors disposed in the column with which the bias line is associated. A current-sum line is associated with each of the columns in the array. Each current-sum line is connected to the drain of each of the N-channel MOS transistors disposed in the column with which the bias line is associated. Circuitry is provided for forward biasing said p-well with respect to the substrate. Circuitry is provided for simultaneously driving a selected one of the bias lines low while driving a selected one of the tunnel lines high, for raising the floating gate voltage of the one of the N-channel MOS transistors common to the selected one of the bias lines and the selected one of the tunnel lines.

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James L. McCreary, et al., "Techniques for a 5-V-Only 64K EPROM Based Upon Substrate Hot-Electron Injection", vol. sc-19, No. 1, Feb. 1984, pp. 135-143, IEEE.

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