One-step process for purifying an inert gas

Details One-step process for purifying an inert gas One-step process for purifying an inert gas

1986-03-31

1987-12-15

Heller, Gregory A.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Molecular oxygen or ozone component

423230, 423247, 423248, C01B 1300, C01B 126, C01B 1716, B01J 800

Patent

active

047132248

ABSTRACT:
There is disclosed a one-step process for purifying an inert gas achieved by contacting the inert gas including minute quantities of an impurity selected from the group consisting of CO, CO.sub.2, O.sub.2, H.sub.2, H.sub.2 O and mixtures thereof with a particulate material comprised of nickel in an amount of at least about 5% by weight as elemental nickel distributed over an effective area of surface, typically from about 100 to 200 m.sup.2 /g, thereby forming an inert gas having less than 1 ppm and preferably less than 0.1 ppm of any such impurity.

REFERENCES:
patent: 4082834 (1978-04-01), Grossman et al.
patent: 4579723 (1986-04-01), Weltmer et al.
Bailar et al., Chemistry, 1978, p. 421.

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