On wafer evaporation installation

Details On wafer evaporation installation On wafer evaporation installation

1996-12-17

1999-12-14

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

118729, 118715, C23C 1600

Patent

active

06001184&

ABSTRACT:
This invention relates to an evaporation installation of the type including a frame rotatably hanging around a first vertical shaft and supporting at least three arms for receiving at least three concave supports of wafers to be processed, rotatably mounted around secondary shafts supported by the arms, the arms being inscribed in a cone which is coaxial to the first shaft so that the secondary shafts have a rotating motion in a plane perpendicular to the vertical shaft. The supports are disposed so as to overlap.

REFERENCES:
patent: 3643625 (1972-02-01), Mahl
patent: 3783821 (1974-01-01), Dobson
patent: 4817559 (1989-04-01), Ciparisso
French Search Report from French Patent Application 95 15829, filed Dec. 27, 1995.
IBM Technical Disclosure Bulletin, vol. 26, No. 10B, Mar. 1984, New York, US, pp. 5604-5605 Anonymous: "Canted Tier Wafer Dome".
Patent Abstracts of Japan, vol. 006, No. 212 (P-151), Oct. 26, 1982 & JP-A-57 117188 (Tokyo Shibaura Denki KK).

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